Fast sample height, AOI and POI alignment in mapping ellipsometer or the like

ABSTRACT

A sample investigation system (ES) in functional combination with an alignment system (AS), and methodology of enabling calibration and very fast, (eg. seconds), sample height, angle-of-incidence and plane-of-incidence adjustments, with application in mapping ellipsometer or the like systems.

This Application is a CIP of application Ser. No. 12/313,760 Filed Nov.25, 2008 and therevia of Claims Benefit of Provisional Application Ser.No. 61/127,062 Filed May 9, 2008. Via application Ser. No. 12/313,760,this Application is a CIP of application Ser. No. 11/890,391 Filed Aug.5, 2007 and therefrom Claims benefit of Provisional 60/836,232 FiledAug. 9, 2006, and therevia is a CIP of Pending patent application Ser.No. 11/105,852 filed Apr. 14, 2005, and therevia this Application Claimsbenefit of Provisional Applications 60/564,747 Filed Apr. 23, 2004, and60/580,314 Filed Jun. 17, 2004. This Application is further aContinuation-In-Part of Utility application Ser. Nos. 10/829,620 FiledApr. 22, 2004; and of 10/925,333 Filed Aug. 24, 2004, and therevia of10/050,802 Filed Jan. 15, 2002, (now U.S. Pat. No. 6,859,278). Via theabove Applications this Application is further a Continuation-In-Part ofUtility application Ser. Nos. 10/925,333 Filed Aug. 24, 2004, and of10/829,620 Filed Apr. 22, 2004, and is a Divisional of 10/050,802 FiledJan. 15, 2002; and via the above Applications Claims Benefit ofProvisional Application Ser. Nos. 60/261,243 Filed Jan. 16, 2001,60/263,874 Filed Jan. 25, 2001, 60/287,784 Filed May 2, 2001. ThisApplication is further a CIP of Utility application Ser. Nos. 10/699,540Filed Nov. 1, 2003, and 10/857,774 Filed May 28, 2004, and thereviaClaims benefit of Provisional Applications 60/424,589 Filed Nov. 7,2002, 60/427,043 Filed Nov. 18, 2002, and 60/480,851 Filed Jun. 24,2003. This Application is further directly a CIP of Pending applicationSer. No. 11/704,545 Filed Feb. 10, 2007 and therevia Claims Benefit ofProvisional Application Ser. No. 60/772,926 Filed Feb. 13, 2006; and isa CIP of Co-Pending application Ser. No. 11/145,470 Filed Jun. 6, 2005,and therevia of Ser. No. 10/376,677 Filed Feb. 28, 2003 and from Ser.Nos. 09/531,877 Filed Mar. 21, 2000; and from 10/178,723 filed Jun. 24,2002; and 09/583,229 filed May 30, 2000; and from 09/864,840 filed May24, 2001; and 09/845,548 filed May 14, 2001; and Claims benefit ofProvisional Application Serial Nos. 60/300,714 filed Jun. 26, 2001, and60/424,589 filed Nov. 7, 2002, and 60/427,043 filed Nov. 18, 2002 and60/431,489 filed Dec. 6, 2002. This Application also is a CIP ofCo-Pending application Ser. No. 10/849,740 Filed May 20, 2004. ThisApplication is also a CIP of Pending application Ser. No. 11/105,852Filed Apr. 14, 2005 also therevia Claims benefit of ProvisionalApplications 60/564,747 Filed Apr. 23, 2004, and 60/580,314 Filed Jun.17, 2004. This Application is further a Continuation-In-Part of Utilityapplication Ser. Nos. 10/829,620 Filed Apr. 22, 2004; and of 10/925,333Filed Aug. 24, 2004, and therevia of 10/050,802 Filed Jan. 15, 2002,(now U.S. Pat. No. 6,859,278). This Application is further aContinuation-In-Part of Utility application Ser. Nos. 10/925,333 FiledAug. 24, 2004, and of 10/829,620 Filed Apr. 22, 2004, and is aDivisional of 10/050,802 Filed Jan. 15, 2002; and via the aboveApplications Claims Benefit of Provisional Application Ser. Nos.60/261,243 Filed Jan. 16, 2001, 60/263,874 Filed Jan. 25, 2001,60/287,784 Filed May 2, 2001.

This Application also is a CIP from application Ser. No. 11/784,750Filed Apr. 10, 2007, and therevia from Provisional Application60/878,799 Filed Jan. 5, 2007.

TECHNICAL AREA

The present invention relates to the practice of ellipsometry,polarimetry, reflectometry and spectrophotometry; and more particularlyto a sample investigation system and method of enabling very fast sampleheight, angle-of-incidence and plane-of-incidence adjustments, withapplication in a sample mapping or the like systems.

BACKGROUND

Ellipsometry is a well known approach to determining physical andoptical properties of samples. To obtain accurate results, however,requires that values for certain adjustable parameters, including thedistance between the ellipsometer and the sample under investigation,(eg. the “height” of the sample), and the angle-of-incidence andplane-of-incidence of the ellipsometer beam with respect to the sample,be known. Where single point on a sample is to be investigated,alignment procedures are well established which provide the requiredvalues within acceptable time constraints, (eg. many seconds to a minuteor so). However, in situations wherein many points on a large sample,(eg. a mapping of the sample is to be performed), the time required todo conventional alignments at each of the many point investigated canintroduce unacceptable, (eg. 5 seconds each), time delays in achievingdesired results. The present invention provides an alignment system, andmethod of its use, which enables very fast, (eg. on the order a secondor two), setting of sample height, and angle, and plane-of-incidence, ateach spot on the sample to be investigated. The present invention alsodiscloses a relevant sample mapping system which applies the alignmentsystem.

As further insight, it is noted that Pending patent application Ser. No.11/890,391 Filed Aug. 5, 2007 provides priority back to application Ser.No. 11/105,852, Filed Apr. 14, 2005, with Priority back to Apr. 23, 2004via Provisional Application Ser. No. 60/564,747, and describes asubstantially self contained flying ellipsometer, polarimeter,reflectometer or spectrophotometer system that provides for moving acombined source and detector of electromagnetic radiation over the asurface of a sample in two, (eg. “X” and “Y”), orthogonal dimensions toenable positioning it at desired locations on, and offset distance fromsample in a “Z” dimension corresponding to a distance between saidcombined source and detector and said sample, and which enables easysequential setting of different Angles-of-Incidence of a beam ofelectromagnetic radiation to a surface of said sample.

As related in the 391 Pending Application, Ellipsometer Systemsgenerally include a source of a beam of electromagnetic radiation, aPolarizer, which serves to impose a known, (typically linear), state ofpolarization on a beam of electromagnetic radiation, a Stage forsupporting a sample, and an Analyzer which serves to select apolarization state in a beam of electromagnetic radiation after it hasinteracted with a material system, and pass it to a Detector System foranalysis therein. As well, one or more Compensator(s) can be present andserve to affect a phase retardance between orthogonal components of apolarized beam of electromagnetic radiation. A number of types ofellipsometer systems exist, such as those which include rotatingelements and those which include modulation elements. Those includingrotating elements include Rotating Polarizer (RP), Rotating Analyzer(RA) and Rotating Compensator (RC). A preferred embodiment is a RotatingCompensator Ellipsometer System because they do not demonstrate“Dead-Spots” where obtaining ellipsometric data is difficult. They canread PSI and DELTA of a Material System over a full Range of Degreeswith the only limitation being that if PSI becomes essentially zero(0.0), one can't then determine DELTA as there is not sufficient PSIPolar Vector Length to form the angle between the PSI Vector and an “X”axis. In comparison, Rotating Analyzer and Rotating PolarizerEllipsometers have “Dead Spots” at DELTA's near 0.0 or 180 Degrees andModulation Element Ellipsometers also have a “Dead Spot” at PSI near 45Degrees). The utility of Rotating Compensator Ellipsometer Systemsshould then be apparent. Another benefit provided by RotatingCompensator Ellipsometer Systems is that the Polarizer (P) and Analyzer(A) positions are fixed, and that provides benefit in that polarizationstate sensitivity to input and output optics during data acquisition isessentially non-existent. This enables relatively easy use of opticfibers, mirrors, lenses etc. for input/output.

Typical construction of spectrophotometer, reflectometer, polarimeter,ellipsometer and the like systems, (eg. Rotating Analyzer, RotatingPolarizer, Rotating Compensator, Modulator Element Ellipsometer),provides a Sample Supporting Stage which is substantially fixed inlocation. Functionally oriented with respect thereto are a SubstantiallyFixed Position Source Means (S) for providing a beam of electromagneticradiation at an oblique angle to said Sample Supporting Stage, and aSubstantially Fixed Position Data Detector Means (D) for interceptingElectromagnetic Radiation which Reflects (or Transmits through), aSample placed on said Sample Supporting Stage. Typical procedure is toplace a Sample onto the Sample Supporting Stage, cause a beam ofElectromagnetic Radiation to impinge thereonto, and record data producedby the Data Detector Means in response to electromagnetic radiationwhich enters thereinto, which data is analyzed to provide insight intoSample Optical and Physical properties. Said procedure can includeadjustment of the Sample Supporting Stage, or the source and detector ofelectromagnetic radiation in an “X”-“Y” Plane, and along a “Z” directionperpendicular to its surface, (ie. a vertical position adjustment wherethe Electromagnetic Radiation approaches the Sample at an oblique anglefrom a laterally located Source). This purpose of said “Z” adjustmentis, for instance, to enable the directing of a beam of ElectromagneticRadiation Reflected from a Sample placed on said Sample Supporting Stageinto the Data Detector without moving the Data Detector so it interceptsa beam exiting said Sample. It should be appreciated then thatconventional Reflectometer, Ellipsometer and Polarimeter Systems whichinclude provision for such Sample positioning adjustment and orientationwith respect to an impinging Electromagnetic beam, typically do so byallowing the Sample Supporting Stage position to be adjusted, ratherthan by effecting simultaneous change in location of the Source and DataDetector with respect to the Sample Supporting Stage, because it is farsimpler to implement Sample Supporting Stage location change. However,an alternative is mount a Reflectometer, Spectrophotometer,Ellipsometer, Polarimeter or the like System to a means for moving it inan “X”-“Y” Plane, and along a “Z” direction perpendicular to its surfaceof the Sample with respect to a substantially fixed position Stage forsupporting a Sample. In either case, however, a relative motion occursbetween the Reflectometer, Ellipsometer, Polarimeter or the like Systemand a sample.

The present invention then breaks with conventional practice by, whiletypically providing a substantially fixed position Stage for supportinga Sample, providing a Reflectometer, Spectrophotometer, Ellipsometer,Polarimeter or the like System which is mounted to a positioning systemwhich allows adjustment its location in an “X”-“Y” Plane, and along a“Z” direction perpendicular to its surface of the Sample. The presentinvention then, allows investigation of a large Sample at many locationsthereof.

Continuing, while present invention systems can be applied in anymaterial system investigation system such as Polarimeter, Reflectometer,Spectrophotometer and the like Systems, an important application is inEllipsometer Systems, whether monochromatic or spectroscopic. It shouldtherefore be understood that Ellipsometry involves acquisition of samplesystem characterizing data at single or multiple Wavelengths, and at oneor more Angle(s)-of-Incidence (AOI) of a Beam of ElectromagneticRadiation to a surface of the sample system.

A typical goal in ellipsometry is to obtain, for each wavelength in, andangle of incidence of said beam of electromagnetic radiation caused tointeract with a sample system, sample system characterizing PSI andDELTA values, (where PSI is related to a change in a ratio of magnitudesof orthogonal components r_(p)/r_(s) in said beam of electromagneticradiation, and wherein DELTA is related to a phase shift entered betweensaid orthogonal components r_(p) and r_(s), caused by interaction withsaid sample system:TAN(ψ)e ^((iΔ)) =r _(p) /r _(s)While Data taken at one (AOI) and one or multiple wavelengths is oftensufficient to allow ellipsometric characterization of a sample system,the results of Ellipsometric Investigation can be greatly enhanced byusing multiple (AOI's) to obtain additional data sets. However, while itis relatively easy to provide Wavelength change without extensivedifficult physical Ellipsometer System Orientation change, it istypically difficult to change the Angle-of-Incidence (AOI) that a Beamof Electromagnetic Radiation makes to a surface of a sample system. An(AOI) change requires that both the Source of the Electromagnetic Beamand the Detector must be re-positioned and aligned, and such is tediousand time consuming. The present invention therefore can provide means toeasily effect (AOI) change. It is also noted that ellipsometric data istypically analyzed by proposing a mathematical model for the sample andregressing it on to said ellipsometric data to arrive at values forparameters in the mathematical model which meet, for instance, a bestfit based on a least square error criteria. Further, it is known toobtain data from multiple similar samples and simultaneously regress thesimilar models onto the different ellipsometric data sets. Thistechnique can break correlation between thickness and refractive index,where the samples have different thicknesses. A similar approach can beapplied to data acquired from multiple spots on a single sample.

A Patent to Finarov, U.S. Pat. No. 5,764,365 is disclosed as itdescribes a system for moving an ellipsometer beam over a largetwo-dimensional area on the surface of a sample system, which systemutilizes beam deflectors.

A Patent to Berger et al., U.S. Pat. No. 5,343,293 describes anEllipsometer which comprises prisms to direct an electromagnetic beamonto a sample system.

A Patent to Canino, U.S. Pat. No. 4,672,196 describes a system whichallows rotating a sample system to control the angle of incidence of abeam of electromagnetic radiation thereonto. Multiple detectors arepresent to receive the resulting reflected beams.

A Patent to Bjork et al., U.S. Pat. No. 4,647,207 describes anellipsometer system in which reflecting elements are moved into the pathof a beam of electromagnetic radiation.

U.S. Pat. No. 6,081,334 to Grimbergen et al. describes a system fordetecting semiconductor end point etching including a means for scanninga beam across the surface of a substrate.

A Patent to Ray, U.S. Pat. No. 5,410,409 describes a system for scanninga laser beam across a sample surface.

U.S. Pat. No. 3,874,797 to Kasai describes means for directing a beam ofelectromagnetic radiation onto the surface of a sample using totallyinternally reflecting prisms.

U.S. Pat. No. 5,412,473 to Rosencwaig et al., describes a ellipsometersystem which simultaneously provides an electromagnetic beam at a samplesurface at numerous angles of incidence thereto.

A Patent to Chen et al., U.S. Pat. No. 5,581,350 is identified as itdescribes the application of regression in calibration of ellipsometersystems.

A Search of Patents which contain both “ellipsometer” and “Mapping”provided Patents Nos.:

-   -   RE40,225 to Finarov;    -   RE38,153 to Finarov;    -   U.S. Pat. No. 6,678,043 to Vurens;    -   U.S. Pat. No. 7,099,010 to Schulz;    -   U.S. Pat. No. 7,295,330 to Chow;    -   U.S. Pat. No. 7,327,444 to Naka et al.

An article by Johs, titled “Regression Calibration Method For RotatingElement Ellipsometers”, which appeared in Thin Film Solids, Vol. 234 in1993 is also identified as it predates the Chen et al. Patent anddescribes an essentially similar approach to ellipsometer calibration.

Even in view of the prior art, need remains for:

-   -   an ellipsometer system which enables very fast, (eg. on the        order a second or two), setting of sample height, and angle, and        plane-of-incidence, at each spot on the sample to be        investigated and a sample mapping system which applies the        alignment system; and    -   an ellipsometer system which is functionally mounted in a three        dimension location means for positioning said selected system at        points in a three dimensional setting, including rotational        capability.

DISCLOSURE OF THE INVENTION

As presented in parent application Ser. No. 12/313,760, a previouslydisclosed embodiment of a present invention comprises a method ofaligning a sample in an ellipsometer system. Said ellipsometer systemcan be described as comprising:

-   -   a source of a beam of electromagnetic radiation;    -   a polarizer;    -   a stage for supporting a sample;    -   an analyzer;    -   a data detector;    -   means for adjusting the relative “height” positioning between        said stage for supporting a sample and, as a unit, said source        of a beam of electromagnetic radiation and data detector; as        well as means for translating relative positioning of said        sample with respect to said source of an ellipsometer beam of        electromagnetic radiation and said data detector, along two        orthogonal axes, and optionally means for adjusting the relative        orientation of the ellipsometer systems with respect to said        sample to set the angle and plane of incidence of said        ellipsometer beam with respect to a surface of said sample.

Said ellipsometer system can comprise at least one compensator and/orfocusing means between said source of a beam of electromagneticradiation and said data detector.

In use a beam of electromagnetic radiation from said source thereofapproaches said sample at an oblique angle-of-incidence and reflectstherefrom into said data detector.

Said method of aligning a sample further comprises the steps of:

-   -   a) functionally mounting a sample alignment system to said        ellipsometer system, which sample alignment system comprises:        -   an alignment source of an alignment beam of electromagnetic            radiation;        -   a first alignment beam focusing means for focusing an            alignment beam of electromagnetic radiation provided from            said source thereof onto a sample on said ellipsometer            system stage for supporting a sample;        -   a second alignment focusing means for focusing alignment            beam electromagnetic radiation which reflects from said            sample onto a two dimensional detector array; and        -   said two dimensional detector array;            such that in use an alignment beam of electromagnetic            radiation from said source thereof is focused onto said            sample at an oblique angle-of-incidence and reflects            therefrom and is focused onto said two dimensional detector            array.            Said sample alignment system can optionally further            comprise:    -   between said second alignment focusing means and said two        dimensional detector array a beam splitter which diverts a        portion of the alignment beam electromagnetic radiation which        reflects from said sample to a secondary two dimensional        detector array, and said secondary two dimensional detector        array.        Said ellipsometer and alignment system are mounted with respect        to one another such that the ellipsometer beam of        electromagnetic radiation and said alignment beam of        electromagnetic radiation impinge on said sample at        substantially the same location.        Said method further can also comprise:        prior to step e, performing steps b and c at least once, said        steps b and c being:    -   b) while:        -   monitoring output intensity from said data detector causing            a beam of electromagnetic radiation from said source thereof            to approach said sample at an oblique angle-of-incidence and            reflect therefrom into said data detector,    -   adjusting the means for adjusting the relative “height”        positioning between said stage for supporting a sample, and, as        a unit, said source of a beam of electromagnetic radiation and        data detector, until output from said data detector is of a        desirable intensity; and    -   c) causing the source of an alignment beam of electromagnetic        radiation from said source thereof to approach said sample at an        oblique angle-of-incidence and reflect therefrom onto said two        dimensional detector array and identifying the location on said        two dimensional detector array as an aligned position.        Said method can then further comprise performing steps d, e and        f a plurality of times, said steps d, e and f being:    -   d) using said means for translating relative positioning of said        sample with respect to, as a unit, said source of an        ellipsometer beam of electromagnetic radiation and said data        detector, along two orthogonal axes, causing relative        translation of said sample along at least one of said orthogonal        axes so that a new spot on said sample is investigated by said        ellipsometer beam, and such that the location at which the        alignment beam reflected from said sample surface in step c        appears on the two dimensional detector array, possibly at a        different location than said aligned position;    -   e) if necessary, adjusting the means for adjusting the relative        “height” positioning between said stage for supporting a sample        and, as a unit, said source of a beam of electromagnetic        radiation and data detector, until said alignment beam reflected        from said sample surface in step c appears on the two        dimensional detector array at said aligned position;    -   f) with the above adjustment set, acquiring ellipsometric data        from said data detector.        Said method can further comprise definitely providing:    -   between said second alignment focusing means and said two        dimensional detector array, a beam splitter which diverts a        portion of the alignment beam electromagnetic radiation which        reflects from said sample to a secondary two dimensional        detector array and said secondary two dimensional detector        array; and    -   means for adjusting the relative orientation of the ellipsometer        with respect to said sample to set the angle and plane of        incidence of said ellipsometer beam with respect to a surface of        said sample.        Said method can then further comprise, prior to step e:    -   while causing a beam of electromagnetic radiation from said        source thereof to approach said sample at an oblique        angle-of-incidence and reflect therefrom into said data        detector, monitoring the output from the data detector and        adjusting the means for adjusting the relative orientation of        the ellipsometer with respect to said sample to set the angle        and plane of incidence of said ellipsometer beam with respect to        a surface of said sample until the intensity of the data        detector output is maximized, and so that electromagnetic        radiation from said alignment source thereof reflects from said        sample and, via said beam splitter, appears on said secondary        two dimensional detector array, and identifying the location on        said secondary two dimensional detector array as an aligned        position;        and in which said method, after practice of the step d causing        of relative translation of said sample along at least one of        said orthogonal axes so that a new spot on said sample is        investigated by said ellipsometer beam, practice of step e,        which step e further comprises:    -   e) adjusting the means for adjusting the relative orientation of        the ellipsometer with respect to said sample to set the angle        and plane of incidence of said ellipsometric beam with respect        to a surface of said sample until said alignment beam reflected        from said sample surface in step c appears on the two        dimensional detector array at said aligned position;        followed by practice of step f.

A more comprehensive recitation of the method of aligning a sample in anellipsometer system comprises, providing an ellipsometer system whichcomprises:

-   -   a source of a beam of electromagnetic radiation;    -   a polarizer;    -   a stage for supporting a sample;    -   an analyzer;    -   a data detector;    -   means for adjusting the relative “height” positioning between        said stage for supporting a sample and, as a unit, said source        of a beam of electromagnetic radiation and data detector; as        well as means for translating relative positioning of said        sample with respect to said source of an ellipsometer beam of        electromagnetic radiation and said data detector, along two        orthogonal axes, and means for adjusting the relative        orientation of the ellipsometer with respect to said sample to        set the angle and plane of incidence of said ellipsometer beam        with respect to a surface of said sample.

Said system optionally can comprise at least one polarizer, analyzer,compensator or focusing means between said source of a sampleinvestigation beam of electromagnetic radiation and said data detector.

In use a beam of electromagnetic radiation from said source thereofapproaches said sample at an oblique angle-of-incidence and reflectstherefrom into said data detector.

Said method also comprises the steps of:

-   -   a) functionally mounting a sample alignment system to said        ellipsometer system, which sample alignment system comprises:        -   an alignment source of an alignment beam of electromagnetic            radiation;        -   a first alignment beam focusing means for focusing an            alignment beam of electromagnetic radiation provided from            said source thereof onto a sample on said ellipsometer            system stage for supporting a sample;        -   a second alignment focusing means for focusing alignment            beam electromagnetic radiation which reflects from said            sample onto a two dimensional detector array; and        -   said two dimensional detector array,            such that in use an alignment beam of electromagnetic            radiation from said source thereof is focused onto said            sample at an oblique angle-of-incidence and reflects            therefrom and is focused onto said two dimensional detector            array.            Said sample alignment system further comprises:    -   between said second alignment focusing means and said two        dimensional detector array, a beam splitter which diverts a        portion of the alignment beam electromagnetic radiation which        reflects from said sample to a secondary two dimensional        detector array, and said secondary two dimensional detector        array;        said ellipsometer and alignment system being mounted with        respect to one another such that the ellipsometer beam of        electromagnetic radiation and said alignment beam of        electromagnetic radiation impinge on said sample at        substantially the same location.        Said method then further comprises, prior to step e, performing        steps b and c at least once, said steps b an c being:    -   b) while causing a beam of electromagnetic radiation from said        source thereof to approach said sample at an oblique        angle-of-incidence and reflect therefrom into said data        detector, monitoring the output from the data detector and        adjusting the means for adjusting the relative orientation of        the ellipsometer with respect to said sample to set the angle        and plane of incidence of said ellipsometer beam with respect to        a surface of said sample until the intensity of the data        detector output is maximized, and so that electromagnetic        radiation from said alignment source thereof reflects from said        sample and, via said beam splitter, appears on said secondary        two dimensional detector array, and identifying the location on        said secondary two dimensional detector array as an aligned        position; and    -   c) while monitoring output intensity from said data detector        causing a beam of electromagnetic radiation from said source        thereof to approach said sample at an oblique angle-of-incidence        and reflect therefrom into said data detector adjusting the        means for adjusting the relative “height” positioning between        said stage for supporting a sample, and, as a unit, said source        of a beam of electromagnetic radiation and data detector until        output from said data detector is of a desirable intensity and        identifying the location on said two dimensional detector array        as an aligned position.        Said method then further comprises performing steps d, e and f a        plurality of times, said steps d, e and f being:    -   d) using said means for translating relative positioning of said        sample with respect to, as a unit, said source of an        ellipsometer beam of electromagnetic radiation and said data        detector, along two orthogonal axes, causing relative        translation of said sample along at least one of said orthogonal        axes so that a new spot on said sample is investigated by said        ellipsometer beam, and such that the location at which the        alignment beam reflected from said sample surface in step c        appears on the two dimensional detector array, possibly at a        different location than said aligned position;    -   e) if necessary, adjusting the means for adjusting the relative        “height” positioning between said stage for supporting a sample        and, as a unit, said source of a beam of electromagnetic        radiation and data detector, until said alignment beam reflected        from said sample surface in step c appears on the two        dimensional detector array at said aligned position and        adjusting the means for adjusting the relative orientation of        the ellipsometer with respect to said sample to set the angle        and plane of incidence of said ellipsometric beam with respect        to a surface of said sample until said alignment beam reflected        from said sample surface in step c appears on the secondary two        dimensional detector array at said aligned position;    -   f) with the above adjustment set, acquiring ellipsometric data        from said data detector.

In the foregoing it is noted that steps b and c are practiced “at leastonce”, while steps d, e and f are practiced “a plurality of times”. Thislanguage is used to indicate that while step c, and optionally step b,could be practiced every time steps d, e and f are practiced at alocation on a sample, it is often sufficient to practice steps c, (andoptionally b), only once each followed by practice of steps d, e and fmany times. This is because the sample can be sufficiently planar sothat setting height, angle and plane of incidence once, for manylocations thereupon, can be sufficient. Hence, while the methodology caninvolve practicing step c, and optionally step b, each time steps d, eand f are practiced, typically this will not be the case.

Present invention methodology of investigating a sample can furthercomprise analyzing ellipsometric data acquired from said data detectorin step f, and that analysis can involve the acquiring of ellipsometricdata involves repeating steps b-f at least twice to obtain ellipsometricdata from at least two spots on said sample, and in which the analysiscomprises simultaneous regression onto data obtained from said at leasttwo spots on said sample.

It is also noted that steps wherein relative “height” positioningbetween said stage for supporting a sample and, as a unit, is involved,the data detector output is set to be of a “desirable intensity”. Thisis to indicate that it need not be “maximized”. However, where relativeorientation of the ellipsometer with respect to said sample to set theangle and plane of incidence of said ellipsometer beam with respect to asurface of said sample is involved, maximizing the data detector outputis practiced. This is because if said angle and/or plane of incidence isnot set to direct a beam into the data detector no data detector outputis obtained and the range over which a signal is detected is small. Thatis, the adjustment for the angle and plane of incidence is criticalwithin tight limits in order to obtain data at all, whereas the heightadjustment does not have such tight limits. Practice might include“maximizing” the data detector output while adjusting for height, butsaid maximization need not in the present invention.

Methodology herein can also involve performing at least one selectionfrom the group consisting of:

-   -   storing at least some data provided by said data detector in        machine readable media;    -   analyzing at least some of the data provided by said data        detector and storing at least some of the results of said        analysis in machine readable media;    -   displaying at least some data provided by said data detector by        electronic and/or non-electronic means;    -   analyzing at least some of the data provided by said data        detector and displaying at least some of the results of said        analysis by electronic and/or non-electronic means;    -   causing at least some data provided by said data detector to        produce a signal which is applied to provide a concrete and        tangible result;    -   analyzing at least some of the data provided by said data        detector and causing at least some thereof to produce a signal        which is applied to provide a concrete and tangible result.

While the foregoing discussed the very relevant application of anexemplary ellipsometer system, the Claims should be broadly consideredto involve any material system investigation system, such as:

-   -   an ellipsometer;    -   a polarimeter;    -   a reflectometer;    -   a spectrophotometer; and    -   a Mueller Matrix measuring system.        In that light, the present invention can be recited as also        comprising a combination sample investigation system and        alignment system comprising a selection from the group        consisting of:    -   an ellipsometer;    -   a polarimeter;    -   a reflectometer;    -   a spectrophotometer; and    -   a Mueller Matrix measuring system;        which comprises:    -   a source of a sample investigation beam of electromagnetic        radiation;    -   a stage for supporting a sample;    -   a data detector;    -   means for adjusting the relative “height” positioning between        said stage for supporting a sample and, as a unit, said source        of a sample investigation beam of electromagnetic radiation and        data detector; as well as, optionally, means for translating        relative positioning of said sample with respect to said source        of a sample investigation beam of electromagnetic radiation and        said data detector, along two orthogonal axes, and optionally        means for adjusting the relative orientation of the sample        investigation system with respect to said sample to set the        angle and plane of incidence of said sample investigation beam        of electromagnetic radiation with respect to a surface of said        sample.

Said system optionally can comprise at least one polarizer, analyzer,compensator or focusing means between said source of a sampleinvestigation beam of electromagnetic radiation and said data detector.

In use a sample investigation beam of electromagnetic radiation fromsaid source thereof approaches said sample at an obliqueangle-of-incidence and reflects therefrom into said data detector.

Said sample investigation system optionally comprises an alignmentsystem which comprises:

-   -   an alignment source of an alignment beam of electromagnetic        radiation;    -   a first alignment beam focusing means for focusing an alignment        beam of electromagnetic radiation provided from said source        thereof onto a sample on said ellipsometer system stage for        supporting a sample;    -   a second alignment focusing means for focusing alignment beam        electromagnetic radiation which reflects from said sample onto a        two dimensional detector array; and    -   said two dimensional detector array;        such that in use an alignment beam of electromagnetic radiation        from said source thereof is focused onto said sample at an        oblique angle-of-incidence and reflects therefrom and is focused        onto said two dimensional detector array.

Said sample alignment system optionally further comprises:

-   -   between said second alignment focusing means and said two        dimensional detector array a beam splitter which diverts a        portion of the alignment beam electromagnetic radiation which        reflects from said sample to a secondary two dimensional        detector array, and said secondary two dimensional detector        array;        said sample investigation system and alignment system being        mounted with respect to one another such that the sample        investigation beam of electromagnetic radiation and said        alignment beam of electromagnetic radiation impinge on said        sample at substantially the same location.

Said combination sample investigation system and alignment system canfurther comprise:

-   -   a mounting frame which supports said combination sample        investigation system, and alignment system, said mounting frame        projecting vertically upward from a horizontally oriented        support as viewed in elevation, and having affixed thereto said        means for adjusting the relative “height” positioning between        said stage for supporting a sample and, as a unit, said source        of a beam of electromagnetic radiation and data detector, as        well as said means for translating relative positioning of said        sample with respect to said source of a beam of electromagnetic        radiation and said data detector, along two orthogonal axes, and        said optional means for adjusting the relative orientation of        the ellipsometer with respect to said sample to set the angle        and plane of incidence of said beam with respect to a surface of        said sample;    -   and in which said stage for supporting a sample is oriented to        secure a sample in a plane slightly offset from said vertically        upward projected plane of said mounting frame so that a sample        entered thereinto does not tend to fall back out thereof, said        stage being of a construction to contact the edges of the sample        only.

Further, said combination sample investigation system and alignmentsystem can further comprise:

-   -   a plurality of clamp means at the edges of said stage whereat        the sample contacts said stage and which secure the sample to        the stage at said edges thereof to better secure said sample,        and to decrease non-planar warping therein.

ADDITIONAL DISCLOSURE

The presently disclosed invention comprises a sample alignment system(AS) in functional combination within a sample investigation system (ES)selected from the group consisting of:

-   -   ellipsometer;    -   polarimeter;    -   reflectometer;    -   spectrophotometer; and    -   Mueller Matrix measuring system;        said sample investigation system (ES) comprising:    -   a source (ELS) of a sample (SAM) investigation beam of        electromagnetic radiation;    -   a stage (STG) for supporting a sample (SAM);    -   a data detector (DDET); and    -   means for adjusting the relative “height” positioning between        said stage (STG) for supporting a sample (SAM) and, as a unit,        said source (ELS) of a sample investigation beam of        electromagnetic radiation and data detector (DDET); as well as        means for translating relative positioning of said sample (SAM)        with respect to said source (ELS) of a sample investigation beam        of electromagnetic radiation and said data detector (DDET),        along two orthogonal axes, and means for adjusting the relative        orientation of the sample investigation system (ES) with respect        to said sample (SAM) to set the angle and plane of incidence of        said sample (SAM) investigation beam of electromagnetic        radiation with respect to a surface of said sample (SAM).        Said sample investigation system (ES) can optionally comprises        at least one polarizer (P), analyzer (A), compensator (RC)        and/or focusing means (CL1) (CL2) (CL3) (CL4) between said        source (ELS) of a sample (SAM) investigation beam of        electromagnetic radiation and said data detector (DDET).

In use a sample investigation beam of electromagnetic radiation fromsaid source (ELS) thereof approaches said sample (SAM) at an obliqueangle-of-incidence and reflects therefrom into said data detector(DDET).

Said alignment system (AS) comprises:

-   -   an alignment source (ALS) of an alignment beam of        electromagnetic radiation;    -   a first alignment beam focusing means (CLA1) for focusing an        alignment beam of electromagnetic radiation provided from said        source (ALS) thereof onto a sample (SAM) on said sample        investigation system (ES) stage (STG) for supporting a sample        (SAM);    -   a second alignment focusing means (CLA2) for focusing alignment        beam electromagnetic radiation which reflects from said sample        onto a two dimensional detector array (SCRN1); and    -   said two dimensional detector array (SCRN1).

Said sample alignment system (AS) further comprises:

-   -   between said second alignment focusing means (CLA2) and said two        dimensional detector array (SCRN1), a beam splitter (BS) which        diverts a portion of the alignment beam electromagnetic        radiation which reflects from said sample (SAM) to a secondary        two dimensional detector array (SCRN2), and said secondary two        dimensional detector array (SCRN2).

In use an alignment beam of electromagnetic radiation from said source(ALS) thereof is focused onto said sample (SAM) at an obliqueangle-of-incidence and reflects therefrom and is focused onto said twodimensional detector array (SCRN1) with a portion thereof being directedto secondary two dimensional detector array (SCRN2) via beam splitter(BS).

Said sample (SAM) investigation system (ES) and alignment system (AS)being mounted with respect to one another such that the sampleinvestigation beam of electromagnetic radiation and said alignment beamof electromagnetic radiation impinge on said sample (SAM) atsubstantially the same location.

In use, while monitoring two dimensional detector array (SCRN1), analignment beam of electromagnetic radiation from said source (ALS)thereof is caused to be focused onto said sample (SAM) at an obliqueangle-of-incidence, reflect therefrom and become focused onto said twodimensional detector array (SCRN1), adjusting the means for adjustingthe relative “height” positioning between said stage (STG) forsupporting a sample until the location at which the alignment beamarrives thereat is at an aligned position thereupon; and such that inuse the means for adjusting the relative orientation of the sampleinvestigation system (ES) with respect to said sample (SAM), to set theangle and plane of incidence of said beam with respect to a surface ofsaid sample (SAM) until said alignment beam reflected from said sample(SAM) surface appears on the two dimensional detector array (SCRN2) analigned position thereupon.

Said sample alignment system can further comprise at least one knownstandard sample (SSMP) positioned away from said stage (STG) forsupporting a sample (SAM), such that in use the sample investigationsystem (ES) and sample alignment system (AS) are positioned so thatelectromagnetic beams from each are directed to intereact with said atleast one known standard sample (SSMP) while data is acquired from atleast the sample investigation system (ES), followed by using said datato calibrate said sample investigation system (ES). And, said samplealignment system can also further comprises a door (D) which is appliedthe cover said at least one known standard sample (SSMP) when it is notin use, to prevent contamination thereof.

A method of investigating a plurality of locations on a sample comprisesthe steps of:

-   -   a) providing a sample alignment system (AS) in functional        combination within a sample investigation system (ES) as        described just above;    -   b) causing the sample investigation system (ES) and sample        alignment system (AS) to be positioned such that electromagnetic        beams from each are directed to intereact with said at least one        known standard sample (SSMP) while data is acquired from at        least the sample investigation system (ES), followed by using        said data to calibrate said sample investigation system (ES);    -   c) causing the sample investigation system (ES) and sample        alignment system (AS) to be positioned such that electromagnetic        beams from each are directed to intereact with a location on        said sample (SAM) such that alignment beam of electromagnetic        radiation from said source (ALS) of the sample alignment system        is focused onto said sample (SAM) location at an oblique        angle-of-incidence, reflects therefrom and is focused onto said        two dimensional detector array (SCRN1) with a portion thereof        being directed to secondary two dimensional detector array        (SCRN2) via beam splitter (BS), followed by using information        derived from screens (SCRN1) and (SCRN2), to adjust the distance        between the sample (SAM) and said source (ELS) of a sample        investigation beam of electromagnetic radiation and said data        detector (DDET) as a unit, and to adjust the angle and plane of        incidence of said sample (SAM) investigation beam of        electromagnetic radiation with respect to a surface of said        sample (SAM);    -   d) acquiring data from said data detector (DDET) and therefrom        deriving sample (SAM) characterizing information therefrom; and    -   e) repeating steps c and d a plurality of times to provide (SAM)        characterizing information at a plurality of locations        thereupon.

Finally, it is noted that the Claims, in part, recite in some stepsprovide for setting data detector output of a “desirable intensity”.This terminology is to be interpreted as including the possibility ofcausing a maximum possible intensity, but where not stated otherwise,not requiring such. For instance, this can be the case where preventionof detector saturation occurs when a maximum detector output occurs.Generally +/−20% maximum is “desirable”.

The disclosed invention will be better understood by reference to theDetailed Description Section of this Disclosure, in combination with theDrawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a combination ellipsometer (ES) and alignment (AS) system.

FIG. 2 a shows that a basic alignment system (AS).

FIG. 2 b is included to show that beam components reflected from thefront (F), and back (B), respectively, sides of the sample (SAM) canform two spots on the two dimensional detector array (SCRN1).

FIG. 3 a shows a preferred sample alignment system (AS) which includes abeam splitter (BS) and a second two dimensional detector array (SCRN2).

FIG. 3 b demonstrates that the (AOI) and (POI) of an ellipsometric beam(EB) can be adjusted with respect to a surface of said sample (SAM/STG)by rotation.

FIG. 3 c shows that adjusting the height (H) between the sample (SAM)and the alignment system (AS), causes a movement of a spot (HA) on twodimensional detector array (SCRN1).

FIG. 3 d shows that a relative tip/tilt between the sample (SAM) and thealignment system (AS) causes a spot (TTA) on the secondary twodimensional detector array (SCRN2) to move vertically with (AOI) andhorizontally with (POI).

FIGS. 4 a, 4 b, 4 b′, 4 b″ and 4 c functionally show that thecombination ellipsometer (ES) and alignment (AS) system can be commonlymounted to a mounting frame (MF) to form a sample mapping system, andthat reference samples (SSMP) and a protective door can be included.

FIGS. 4 d-4 f show actual embodiment mounting frame (MF), stage (STG)and sample (SAM).

DETAILED DESCRIPTION

Turning now to the Drawings, FIG. 1 shows a combination ellipsometer(ES) and alignment (AS) system. The ellipsometer system (ES) isdemonstrated as comprising:

-   -   a source of a beam of electromagnetic radiation (ELS);    -   a polarizer (P);    -   a stage for supporting a sample (SAM/STG);    -   an analyzer (A);    -   a data detector (DDET); and    -   means for adjusting the relative “height” (H) positioning        between said stage for supporting a sample (SAM/STG) and, as a        unit, said source (ELS) of an ellipsometer beam (EB) of        electromagnetic radiation and data detector (DDET); as well as        means for translating relative positioning of said sample        (SAM/STG) with respect to, as a unit, said source (ELS) of an        ellipsometer beam (EB) of electromagnetic radiation and said        data detector, along two orthogonal axes; and optionally means        for adjusting the relative orientation of the ellipsometer with        respect to said sample (SAM/STG) to set the angle (AOI) and        plane (POI) of incidence, (see FIG. 3 b), of said ellipsometer        beam (EB) with respect to a surface of said sample (SAM/STG).        Said ellipsometer system is shown to optionally comprise at        least one compensator ((RC) and/or focusing means (CL1) (CL2)        CL3) CL4) between said source (ELS) of a beam (EB) of        electromagnetic radiation and said data detector (DDET). In use        an ellipsometer beam (EB) of electromagnetic radiation from said        source (WLS) thereof approaches said sample (SAM/STG) at an        oblique angle-of-incidence and reflects therefrom into said data        detector (DDET) which produces analyzable data.

FIG. 2 a shows that a basic alignment system (AS) comprises:

-   -   an alignment source (ALS) of an alignment beam (AB) of        electromagnetic radiation;    -   a first alignment beam (AB) focusing means (CLA1) for focusing        an alignment beam (AB) of electromagnetic radiation provided        from said source thereof onto the sample (SAM/STG) on said        ellipsometer system stage (STG) for supporting a sample (SAM);    -   a second alignment focusing means (CLA2) for focusing alignment        beam electromagnetic radiation which reflects from said sample        (SAM) onto a two dimensional detector array (SCRN1); and    -   said two dimensional detector array (SCRN1).        In use an alignment beam (AB) of electromagnetic radiation from        said alignment source (ALS) thereof is focused onto said sample        (SAM) at an oblique angle-of-incidence and reflects therefrom        and is focused onto said two dimensional detector array (SCRN1).

FIG. 2 b is included to show that beam components reflected from thefront (F), and back (B), respectively, sides of the sample (SAM) canform two spots on the two dimensional detector array (SCRN1). Thedistance between said spots is related to the thickness of the sample(SAM).

FIG. 3 a shows that said sample alignment system (AS) preferably furthercomprises:

-   -   between said second alignment focusing means (CLA2) and said two        dimensional detector array (SCRN1) a beam splitter (BS) which        diverts a portion of the alignment beam (AB) electromagnetic        radiation which reflects from said sample (SAM) to a secondary        two dimensional detector array (SCRN2).        Said ellipsometer (ES) and alignment (AS) systems are mounted        with respect to one another such that the ellipsometer beam (EB)        of electromagnetic radiation and said alignment beam (AB) of        electromagnetic radiation impinge on said sample (SAM) at        substantially the same location thereupon. FIG. 3 b serves to        show that the sample (SAM) and stage (STG) might be rotated        about orthogonal axes to set (AOI) and POI) of the alignment        beam (AB). This should be interpreted to indicate that a        functionally equivalent rotational capability can, perhaps        alternatively, be provided to the alignment system (AS) and that        is relative rotations between the sample (SAM) and alignment        system (AL) which is important in the present invention.

FIG. 3 c shows that adjusting the height (H) between the sample (SAM)and the alignment system (AS), causes a movement of a spot (HA) on twodimensional detector array (SCRN1). FIG. 3 d shows that a relativetip/tilt between the sample (SAM) and the alignment system (AS) causes aspot (TTA) on the secondary two dimensional detector array (SCRN2) tomove vertically with (AOI) and horizontally with (POI). Said FIGS. 3 cand 3 d actually provide specific insight to how the present inventionis able to adjust height (H) and (AOI) and (POI) very quickly. Relativeheight (H) translation and relative (AOI) and (POI) rotations betweenthe stage (STG), (note the stage (STG) is fixed in the FIGS. 4 a-4 c),and the alignment system (AS) can be performed to position the spots(HA) and (TTA) on two dimensional detector arrays (SCRN1) and (SCRN2) atpositions thereon identified as “ideal” (I) therein. The methodology foraccomplishing this is described in the Disclosure of the InventionSection of the Disclosure.

Continuing, FIGS. 4 a-4 c functionally show that the combinationellipsometer (ES) and alignment (AS) system just described can furthercomprise:

-   -   a mounting frame (MF) which supports said combination        ellipsometer (ES) and alignment (AL) system, said mounting frame        (MF) projecting vertically upward from a horizontally oriented        support as viewed in elevation. FIG. 4 c indicates the presence        of means for adjusting the relative “height” (H) positioning        between said stage (STG) for supporting a sample (SAM) and, as a        unit, said source of a beam of electromagnetic radiation and        data detector (collectively indicated by (ES)). A well, said        means for translating (HR) (DR) relative positioning of said        sample with respect to said source of a beam of electromagnetic        radiation and said data detector, along two orthogonal axes.        Said optional means for adjusting the relative orientation of        the ellipsometer, (indicated by circular arrows), with respect        to said sample to set the angle and plane of incidence of said        ellipsometric beam with respect to a surface of said sample        (SAM).

Further, FIG. 4 c shows that said stage (STG) for supporting a sample(SAM) is oriented to secure a sample (SAM) in a plane slightly offsetfrom said vertically upward projected plane of said mounting frame (MF)so that a sample (SAM) entered thereinto does not tend to fall back outthereof, said stage (STG) being of a construction to contact the edgesof the sample only, (see FIG. 4 a). Also note that a plurality of “clampmeans” (LTCH) at the edges of said stage (STG) in FIGS. 4 a and 4 c,whereat the sample (SAM) contacts said stage (STG). Said clamp meanssecure the sample (SAM) to the stage (STG) at said edges thereof tobetter secure said sample (SAM), and to decrease non-planar warpingtherein. It is noted that sample (SAM) investigated in the presentinvention can be on the order of a meter or so long along a side and assuch can be expected to demonstrate a non-planar surface.

In view of FIGS. 4 a-4 c, it is disclosed that the present invention canbe recast as a sample (SAM) mapping system comprising a mounting frame(MF) which supports a combination ellipsometer (ES) and alignment (AS)system, said mounting frame (MF) projecting substantially verticallyupward from a substantially horizontally oriented support, as viewed inelevation, and where said combination ellipsometer (ES) and alignment(AS) system are described above. Also note that FIG. 4 b shows theellipsometer system (ES) can be moved horizontally via a sliding actionin guides (HR) or vertically by a sliding action in guides (VR). FIG. 4c indicates guides (DR) allow forward and backward motion which can beapplied to adjust (H), (eg. the “height” between the sample (SAM) andthe combination (ES). FIG. 4 c allows shows that the sample (SAM) is notoriented vertically, but rather is mounted in a fixed position at aslight off-vertical orientation. This is to better secure the sample(SAM). However, achieving that benefit requires that the combination(ES) be rotatable to provide (AOI) and (POI) adjustment capability asshown.

It is noted that FIG. 4 b also shows Standard Samples (SSMP) mounted ata location whereat the Ellipsometer system (ES) can cause an incidentbeam to impinge thereupon. In use, the Ellipsometer system (E) can bepositioned to “investigate” a Standard Sample (SSMP) which has knownphysical and/or optical properties, and the data obtained from the DataDetector (DDET) while the Ellipsometer system (ES) is so positioned canbe used to calibrate the Ellipsometer system (ES) via a regressionprocedure. This calibration approach is described in Patent to Johs etal. U.S. Pat. No. 5,872,630 and basically evaluates parameters in amathematical model which describe Ellipsometer system (ES) components,in the same way Sample (SAM) parameters are evaluated. FIGS. 4 b′ and 4b″ better show the Standard Samples (SSMP), and that Door (D) can beused as protection between uses.

FIGS. 4 d-4 f show an actual embodiment mounting frame (MF), stage (STG)and sample (SAM), also showing guides (HR) and (VR) and the location atwhich the combination ellipsometer (ES) and alignment (AS) system ismounted in the mounting frame (MF), as were functionally indicated inFIGS. 4 a-4 c.

It is also noted that the alignment and secondary alignment screens(SCRN1) (SCRN2) can double as means to provide an image of the sample,when an illumination source is added to the alignment system (AS), (notshown). When that is done, as described in Pending application Ser. No.11/784,750, a relatively large area of the sample surface can be viewedin focus if the relative tilt between the sample (SAM) and the alignmentsystem (AS) is seet to meet the Scheimpflug condition. The 750Application is included by reference herein.

While the foregoing discussed the very relevant application of anellipsometer system, the Claims should be broadly considered to includeany material system investigation systems such as:

-   -   ellipsometer;    -   polarimeter;    -   reflectometer;    -   spectrophotometer; and    -   Mueller Matrix measuring system;        which operate at least one wavelength in at least one wavelength        range, such as:    -   VUV;    -   UV;    -   Visible;    -   Infrared;    -   Far Infrared;    -   Radio Wave.        The major difference between an ellipsometer, polarimeter and        Mueller Matrix measuring system as compared to a reflectometer        or spectrophotometer is that the reflectometer or        spectrophotometer does not comprise polarization related        elements such as a polarizer (P) and analyzer (A).

Finally, it is noted that the two dimensional detector array (SCRN1) andsecondary two dimensional detector array (SCRN2) can be CDD or CMOSCamera etc.

Having hereby disclosed the subject matter of the present invention, itshould be obvious that many modifications, substitutions, and variationsof the present invention are possible in view of the teachings. It istherefore to be understood that the invention may be practiced otherthan as specifically described, and should be limited in its breadth andscope only by the Claims.

We claim:
 1. A sample alignment system (AS) in functional combinationwithin a sample investigation system (ES) selected from the groupconsisting of: ellipsometer; polarimeter; reflectometer;spectrophotometer; and Mueller Matrix measuring system; said sampleinvestigation system (ES) comprising: a source (ELS) of a sample (SAM)investigation beam of electromagnetic radiation; a stage (STG) forsupporting a sample (SAM); a data detector (DDET); and means foradjusting the relative “height” positioning between said stage (STG) forsupporting a sample (SAM) and, as a unit, said source (ELS) of a sampleinvestigation beam of electromagnetic radiation and data detector(DDET); as well as means for translating relative positioning of saidsample (SAM) with respect to said source (ELS) of a sample investigationbeam of electromagnetic radiation and said data detector (DDET), alongtwo orthogonal axes, and means for adjusting the relative orientation ofthe sample investigation system (ES) with respect to said sample (SAM)to set the angle and plane of incidence of said sample (SAM)investigation beam of electromagnetic radiation with respect to asurface of said sample (SAM); said sample investigation system (ES)optionally comprising at least one polarizer (P), analyzer (A),compensator (RC) and/or focusing means (CL1) (CL2) (CL3) (CL4) betweensaid source (ELS) of a sample (SAM) investigation beam ofelectromagnetic radiation and said data detector (DDET); such that inuse a sample investigation beam of electromagnetic radiation from saidsource (ELS) thereof approaches said sample (SAM) at an obliqueangle-of-incidence and reflects therefrom into said data detector(DDET); and wherein said alignment system (AS) comprises: an alignmentsource (ALS) of an alignment beam of electromagnetic radiation; a firstalignment beam focusing means (CLA1) for focusing an alignment beam ofelectromagnetic radiation provided from said source (ALS) thereof onto asample (SAM) on said sample investigation system (ES) stage (STG) forsupporting a sample (SAM); a second alignment focusing means (CLA2) forfocusing alignment beam electromagnetic radiation which reflects fromsaid sample onto a two dimensional detector array (SCRN1); and said twodimensional detector array (SCRN1); said sample alignment system (AS)further comprising: between said second alignment focusing means (CLA2)and said two dimensional detector array (SCRN1), a beam splitter (BS)which diverts a portion of the alignment beam electromagnetic radiationwhich reflects from said sample (SAM) to a secondary two dimensionaldetector array (SCRN2), and said secondary two dimensional detectorarray (SCRN2); such that in use an alignment beam of electromagneticradiation from said source (ALS) thereof is focused onto said sample(SAM) at an oblique angle-of-incidence and reflects therefrom and isfocused onto said two dimensional detector array (SCRN1) with a portionthereof being directed to secondary two dimensional detector array(SCRN2) via beam splitter (BS); said sample (SAM) investigation system(ES) and alignment system (AS) being mounted with respect to one anothersuch that the sample investigation beam of electromagnetic radiation andsaid alignment beam of electromagnetic radiation impinge on said sample(SAM) at substantially the same location; such that in use, whilemonitoring two dimensional detector array (SCRN1), causing an alignmentbeam of electromagnetic radiation from said source (ALS) thereof to befocused onto said sample (SAM) at an oblique angle-of-incidence, reflecttherefrom and become focused onto said two dimensional detector array(SCRN1), adjusting the means for adjusting the relative “height”positioning between said stage (STG) for supporting a sample until thelocation at which the alignment beam arrives thereat is at an alignedposition thereupon; and such that in use the means for adjusting therelative orientation of the sample investigation system (ES) withrespect to said sample (SAM), to set the angle and plane of incidence ofsaid beam with respect to a surface of said sample (SAM) until saidalignment beam reflected from said sample (SAM) surface appears on thetwo dimensional detector array (SCRN2) an aligned position thereupon. 2.A sample alignment system as in claim 1, which further comprises atleast one known standard sample (SSMP) positioned away from said stage(STG) for supporting a sample (SAM), such that in use the sampleinvestigation system (ES) and sample alignment system (AS) arepositioned so that electromagnetic beams from each are directed tointereact with said at least one known standard sample (SSMP) while datais acquired from at least the sample investigation system (ES), followedby using said data to calibrate said sample investigation system (ES).3. A sample alignment system as in claim 1, which further comprises adoor (D) which is applied to cover said at least one known standardsample (SSMP) when it is not in use, to prevent contamination thereof.4. A method of investigating a plurality of locations on a samplecomprising the steps of: a) providing a sample alignment system (AS) infunctional combination within a sample investigation system (ES)selected from the group consisting of: ellipsometer; polarimeter;reflectometer; spectrophotometer; and Mueller Matrix measuring system;said sample investigation system (ES) comprising: a source (ELS) of asample (SAM) investigation beam of electromagnetic radiation; a stage(STG) for supporting a sample (SAM); a data detector (DDET); and meansfor adjusting the relative “height” positioning between said stage (STG)for supporting a sample (SAM) and, as a unit, said source (ELS) of asample investigation beam of electromagnetic radiation and data detector(DDET); as well as means for translating relative positioning of saidsample (SAM) with respect to said source (ELS) of a sample investigationbeam of electromagnetic radiation and said data detector (DDET), alongtwo orthogonal axes, and means for adjusting the relative orientation ofthe sample investigation system (ES) with respect to said sample (SAM)to set the angle and plane of incidence of said sample (SAM)investigation beam of electromagnetic radiation with respect to asurface of said sample (SAM); said sample investigation system (ES)optionally comprising at least one polarizer (P), analyzer (A),compensator (RC) and/or focusing means (CL1) (CL2) (CL3) (CL4) betweensaid source (ELS) of a sample (SAM) investigation beam ofelectromagnetic radiation and said data detector (DDET); such that inuse a sample investigation beam of electromagnetic radiation from saidsource (ELS) thereof approaches said sample (SAM) at an obliqueangle-of-incidence and reflects therefrom into said data detector(DDET); and wherein said alignment system (AS) comprises: an alignmentsource (ALS) of an alignment beam of electromagnetic radiation; a firstalignment beam focusing means (CLA1) for focusing an alignment beam ofelectromagnetic radiation provided from said source (ALS) thereof onto asample (SAM) on said sample investigation system (ES) stage (STG) forsupporting a sample (SAM); a second alignment focusing means (CLA2) forfocusing alignment beam electromagnetic radiation which reflects fromsaid sample onto a two dimensional detector array (SCRN1); and said twodimensional detector array (SCRN1); said sample alignment system (AS)further comprising: between said second alignment focusing means (CLA2)and said two dimensional detector array (SCRN1), a beam splitter (BS)which diverts a portion of the alignment beam electromagnetic radiationwhich reflects from said sample (SAM) to a secondary two dimensionaldetector array (SCRN2), and said secondary two dimensional detectorarray (SCRN2); such that in use an alignment beam of electromagneticradiation from said source (ALS) thereof is focused onto said sample(SAM) at an oblique angle-of-incidence and reflects therefrom and isfocused onto said two dimensional detector array (SCRN1) with a portionthereof being directed to secondary two dimensional detector array(SCRN2) via beam splitter (BS); said alignment system (AS) furthercomprising at least one known standard sample (SSMP) positioned awayfrom said stage (STG) for supporting a sample (SAM); said sample (SAM)investigation system (ES) and alignment system (AS) being mounted withrespect to one another such that the sample investigation beam ofelectromagnetic radiation and said alignment beam of electromagneticradiation impinge on said sample (SAM) at substantially the samelocation; such that in use, while monitoring two dimensional detectorarray (SCRN1), causing an alignment beam of electromagnetic radiationfrom said source (ALS) thereof to be focused onto said sample (SAM) atan oblique angle-of-incidence, reflect therefrom and become focused ontosaid two dimensional detector array (SCRN1), adjusting the means foradjusting the relative “height” positioning between said stage (STG) forsupporting a sample until the location at which the alignment beamarrives thereat is at an aligned position thereupon; and such that inuse the means for adjusting the relative orientation of the sampleinvestigation system (ES) with respect to said sample (SAM), to set theangle and plane of incidence of said beam with respect to a surface ofsaid sample (SAM) until said alignment beam reflected from said sample(SAM) surface appears on the two dimensional detector array (SCRN2) analigned position thereupon; b) causing the sample investigation system(ES) and sample alignment system (AS) to be positioned such thatelectromagnetic beams from each are directed to intereact with said atleast one known standard sample (SSMP) while data is acquired from atleast the sample investigation system (ES), followed by using said datato calibrate said sample investigation system (ES); c) causing thesample investigation system (ES) and sample alignment system (AS) to bepositioned such that electromagnetic beams from each are directed tointereact with a location on said sample (SAM) such that alignment beamof electromagnetic radiation from said source (ALS) of the samplealignment system is focused onto said sample (SAM) location at anoblique angle-of-incidence, reflects therefrom and is focused onto saidtwo dimensional detector array (SCRN1) with a portion thereof beingdirected to secondary two dimensional detector array (SCRN2) via beamsplitter (BS), followed by using information derived from screens(SCRN1) and (SCRN2), to adjust the distance between the sample (SAM) andsaid source (ELS) of a sample investigation beam of electromagneticradiation and said data detector (DDET) as a unit, and to adjust theangle and plane of incidence of said sample (SAM) investigation beam ofelectromagnetic radiation with respect to a surface of said sample(SAM); d) acquiring data from said data detector (DDET) and therefromderiving sample (SAM) characterizing information therefrom; and e)repeating steps c and d a plurality of times to provide (SAM)characterizing information at a plurality of locations thereupon.
 5. Amethod of aligning a sample in an ellipsometer system, whichellipsometer system comprises: a source of a beam of electromagneticradiation; a polarizer; a stage for supporting a sample; an analyzer; adata detector; means for adjusting the relative “height” positioningbetween said stage for supporting a sample and, as a unit, said sourceof a beam of electromagnetic radiation and data detector; as well asmeans for translating relative positioning of said sample with respectto said source of an ellipsometer beam of electromagnetic radiation andsaid data detector, along two orthogonal axes, and optionally means foradjusting the relative orientation of the ellipsometer systems withrespect to said sample to set the angle and plane of incidence of saidellipsometer beam with respect to a surface of said sample; saidellipsometer system optionally comprising at least one compensatorand/or focusing means between said source of a beam of electromagneticradiation and said data detector; such that in use a beam ofelectromagnetic radiation from said source thereof approaches saidsample at an oblique angle-of-incidence and reflects therefrom into saiddata detector; said method comprising the steps of: a) functionallymounting a sample alignment system to said ellipsometer system, whichsample alignment system comprises: an alignment source of an alignmentbeam of electromagnetic radiation; a first alignment beam focusing meansfor focusing an alignment beam of electromagnetic radiation providedfrom said source thereof onto a sample on said ellipsometer system stagefor supporting a sample; a second alignment focusing means for focusingalignment beam electromagnetic radiation which reflects from said sampleonto a two dimensional detector array; and said two dimensional detectorarray; such that in use an alignment beam of electromagnetic radiationfrom said source thereof is focused onto said sample at an obliqueangle-of-incidence and reflects therefrom and is focused onto said twodimensional detector array; said sample alignment system optionallyfurther comprising: between said second alignment focusing means andsaid two dimensional detector array a beam splitter which diverts aportion of the alignment beam electromagnetic radiation which reflectsfrom said sample to a secondary two dimensional detector array, and saidsecondary two dimensional detector array; said ellipsometer andalignment system being mounted with respect to one another such that theellipsometer beam of electromagnetic radiation and said alignment beamof electromagnetic radiation impinge on said sample at substantially thesame location; said method further comprising: prior to step e,performing steps b and c at least once, in which steps b and c are: b)while monitoring output intensity from said data detector causing a beamof electromagnetic radiation from said source thereof to approach saidsample at an oblique angle-of-incidence and reflect therefrom into saiddata detector, adjusting the means for adjusting the relative “height”positioning between said stage for supporting a sample, and, as a unit,said source of a beam of electromagnetic radiation and data detector,until output from said data detector is of a desirable intensity; and c)causing the source of an alignment beam of electromagnetic radiationfrom said source thereof to approach said sample at an obliqueangle-of-incidence and reflect therefrom onto said two dimensionaldetector array and identifying the location on said two dimensionaldetector array as an aligned position; said method further comprisingperforming steps d, e and f a plurality of times, wherein steps d, e andf are: d) using said means for translating relative positioning of saidsample with respect to, as a unit, said source of an ellipsometer beamof electromagnetic radiation and said data detector, along twoorthogonal axes, causing relative translation of said sample along atleast one of said orthogonal axes so that a new spot on said sample isinvestigated by said ellipsometer beam, and such that the location atwhich the alignment beam reflected from said sample surface in step cappears on the two dimensional detector array, possibly at a differentlocation than said aligned position; e) if necessary, adjusting themeans for adjusting the relative “height” positioning between said stagefor supporting a sample and, as a unit, said source of a beam ofelectromagnetic radiation and data detector, until said alignment beamreflected from said sample surface in step c appears on the twodimensional detector array at said aligned position; f) with the aboveadjustment set, acquiring ellipsometric data from said data detector. 6.A method as in claim 5, in which the which the ellipsometer systemfurther comprises at least one known standard sample (SSMP) positionedaway from said stage (STG) for supporting a sample (SAM), such that inuse the sample investigation system (ES) and sample alignment system(AS) are positioned so that electromagnetic beams from each are directedto intereact with said at least one known standard sample (SSMP) whiledata is acquired from at least the sample investigation system (ES),followed by using said data to calibrate said sample investigationsystem (ES).
 7. A method as in claim 6, which further comprises a door(D) which is applied to cover said at least one known standard sample(SSMP) when it is not in use, to prevent contamination thereof.